IES Blog

Advantages of Microwave Plasma

Microwave (MW) plasma is state of the art for surface treatment of sensitive electronic devices.

Here are some of the reasons to consider using microwave plasma: 

1. No self-bias
   - No ion bombardment
   - MW creates a chemical reaction only, thus no risk of surface damage
2. Faster process times
   - Operating at 2.45 GHz (vs. 2-60 MHz for traditional RF), MW creates naturally higher density reactive radicals
3. Reduces process variability within your chamber
   - Homogeneity on all substrates
   - Reproducability on all substrates
4. Remote MW Plasma
   - Substrates/parts are not in the plasma zone; only reactive
   radicals are treating the surface
   - Substrate/part surfaces do NOT heat up

 

 

 

 

 

 

 

 

 

IES Technical Sales is a value added technical sales, distribution, and solutions provider serving the high technology vacuum, plasma/thin film, temperature, fluid handling and metrology markets.